Research papers

  1. Infrared Absorption Spectroscopic Study on Reaction between Self-Assembled Monolayers and Atmospheric-Pressure Plasma
    Journal of Spectroscopy, Vol. 2015, Article ID 417024, 7 pages (2015.2) IF=0.831
    M. Shinohara, K. Amano, N. Maruno, Y. Yoshida, Y. Matsuda, and H. Fujiyama
  2. Infrared spectroscopic study on reactions of octadecyltrichlorosilane self-assembled monolayer with Plasmas
    Jpn. J. Appl. Phys.,54(1), 01AB04 (6 pages) (2015. 01)*, IF:1.057
    M. Shinohara, N. Maruno, Y. Yoshida, Y. Taniguchi, K. Ito, Y. Nakano, Y. Matsuda, H. Fujiyama
  3. Measurement of energy flux to a substrate by thermal and Langmuir probes during inductively coupled plasma assisted DC magnetron sputtering
    Jpn. J. Appl. Phys. 54 01AB02 (2015.1)*, IF:1.057
    Y. Matsuda, K. Mine, S. Wakiyama, M. Shinohara
  4. Adsorption of hydrocarbon components generated in deuterated benzen plasma studied by in situ real-time infrared absorption spectroscopy
    Jpn. J. Appl. Phys. 53 096202 (2014.9).*, IF:1.057
    M. Shinohara, Y. Taniguchi, Y. Takaki, Y. Matsuda, H. Fujiyama
  5. Infrared Spectroscopic Study on Deposition Process of the Amorphous Carbon Film with Benzene Molecule as a Source in Plasma Enhanced Chemical Vapor Deposition
    JPS Conference Proceedings Vol.1, Proceedings of the 12th Asia Pacific Physics Conference (APPC12), July 14?19, 2013, Makuhari, Japan, e-ISBN: 978-4-89027-101-6, 10.7566/JPSCP.1.015081 (2014.3)
    M. Shinohara, Y. Taniguchi, Y. Takaki, S. Yagi, Y. Matsuda, H. Fujiyama
  6. Energy Flux to a Substrate in ICP Assisted Magnetron Sputtering
    JPS Conference Proceedings Vol.1, Proceedings of the 12th Asia Pacific Physics Conference (APPC12), July 14?19, 2013, Makuhari, Japan, e-ISBN: 978-4-89027-101-6, 10.7566/JPSCP.1.015063 (2014.3)
    Y. Matsuda, T. Hashimoto, S. Akiba, Y. Sakaguchi, S. Wakiyama, M. Shinohara
  7. Reactions of Surface Hydrogen on Amorphous Carbon Films with Hydrogen Plasma
    Jpn. J. Appl. Phys. Vol. 53 No. 1, 010204 (6 pages) (2014.1). IF: 1.067
    M. Shinohara, T. Kawakami, K. Hara, S. Yagi, Y.Matsuda, H.Fujiyama
  8. Development of an in-situ infrared spectroscopic measurement of plasma-induced reactions in ethanol
    Jpn. J. Appl. Phys. Vol. 52 No. 1111NC06 (5 pages) (2013.11). IF: 1.067
    M. Shinohara, A. Fuakae, K. Amano, Y. Yoshida, Y. Matsuda, H. Fujiyama
  9. Evolution of Hydride Components Generated by Hydrogen Plasma Irradiation of a Si(110) Surface, Investigated with In-situ Infrared Absorption Spectroscopy in Multiple Internal Reflection Geometry
    IEEE Transactions of Plasma Science 41, Issue 8, pp. 1878-1883 (2013.8) IF: 0.868
    M. Shinohara, Y. Takami, S. Takabayashi, A. Oda, Y. Matsuda, and H. Fujiyama
  10. Surface modification of DLC film due to oxygen plasma exposure observed by IR absorption spectroscopy in multiple-internal-reflection geometry
    IEEE Transactions of Plasma Science, Vol.40, No.10, (2012) 2756-2761 (2012.10)
    M. Shinohara, Y. Takaki, Y. Takami, Y. Matsuda, and H. Hujiyama
  11. Gas Temperature and Heat Flux to the Substrate in ICP-Assisted Magnetron Sputter-Deposition of Aluminium-Doped ZnO Films
    Proceedings of 3rd International Conference on High Power Impulse Magnetron Sputtering (HIPIMS 2012) 19?20 June 2012, Sheffield, United Kingdom, (submitted to IOP Conference Series: Materials Science and Engineering, 2012)
    Y. Matsuda, A. Hirashima, K. Mine, T. Hashimoto, D. Matsuoka, M. Shinohara and T. Okada
  12. Infrared Spectroscopic study on a Reaction of Hydrogen Plasma with Si(110) surface
    Transactions of MRS-Japan, vol. 36 No. 3 pp. 491-494 (2011.9)
    M. Shinohara, K. Hara, Y. Takami, Y. Takaki, Y. Matsuda, and H. Fujiyama,
  13. Thermal Probe Measurements of Energy Flux onto a Substrate during ICP Assisted Sputter-Deposition
    Proceedings of the 20th International Symposium on Plasma Chemistry (ISPC20), Philadelphia, USA, July 24th - 29th, 2011, No. 537 (4pages) (2011.7)
    H. Kitagawa, K. Mine, M. Shinohara, Y. Matsuda, T. Okada
  14. Absorption Measurement of Sputtered Atom Density during ICP-Assisted Sputter-Deposition of Al-doped ZnO Thin Films
    Proceedings of the 20th International Symposium on Plasma Chemistry (ISPC20), Philadelphia, USA, July 24th - 29th, 2011, No. 536 (4pages) (2011.7)
    R. Shindo, A. Hirashima, M. Shinohara, Y. Matsuda, K. Sakai, T. Okada
  15. Deposition of Transparent Conducting Al-Doped ZnO Thin Films by ICP-Assisted Sputtering
    TENCON 2010 IEEE Region 10 Conference Proceedings, November 21-24, 2010, Fukuoka Japan. T2-7.3 pp.1002-1006 (ISBN:978-1-4244-6888-1) (2010.11)
    R. Shindo, T. Iwata, A. Hirashima, M. Shinohara, Y. Matsuda
  16. Thermal Probe Measurements of Energy Flux onto a Substrate during ICP Assisted Sputter-Deposition
    TENCON 2010 IEEE Region 10 Conference Proceedings, November 21-24, 2010, Fukuoka Japan. T2-5.P2 pp.2208-2212 (ISBN:978-1-4244-6888-1) (2010.11)
    H. Kitagawa, R. Kan, K. Mine, M. Shinohara, Y. Matsuda
  17. Infrared Spectroscopic Study on Hydrogen Plasma Induced Surface Reaction
    TENCON 2010 IEEE Region 10 Conference Proceedings, November 21-24, 2010, Fukuoka Japan. T2-20.P1 pp.1948-1950 (ISBN: 978-1-4244-6888-1)(2010.11)
    M. Shinohara, T. Kawakami, K. Hara, and H. Fujiyama, Y. Matsuda, Y. Nitta and T. Nakatani
  18. Infrared spectroscopic study on substrate bias effects on amorphous carbon deposition process during acetylene plasma
    Bulletin of the American Physical Society, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, October 4-8, 2010, Paris France, Volume 55, Number 7, LW4.00004 (2010.10)
    M. Shinohara, T. Kawakami, K. Hara, Y. Matsuda, H. Fujiyama, Y. Nitta, T. Nakatani
  19. Inductively Coupled Plasma Assisted Sputter-Deposition of Al-doped ZnO Thin Films
    Bulletin of the American Physical Society, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, October 4-8, 2010, Paris France, Volume 55, Number 7, DTP.00036 (2010.10)
    Y. Matsuda, R. Shindo, A. Hirashima, M. Shinohara
  20. Substrate temperature effects on amorphous carbon deposition process during acetylene plasma, investigated infrared spectroscopy
    Bulletin of the American Physical Society, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, October 4-8, 2010, Paris France, Volume 55, Number 7, CTP.00111 (2010.10)
    K. Hara, T. Kawakami, M. Shinohara, Y. Matsuda, H. Fujiyama
  21. Energy Flux onto a Substrate during ICP Assisted Sputter-Deposition
    Bulletin of the American Physical Society, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, October 4-8, 2010, Paris France, Volume 55, Number 7, CTP.00010 (2010.10)
    Y. Matsuda, Hiroaki Kitagawa, Kenji Mine, M. Shinohara
  22. Infrared spectroscopic study on oxidation of carbon for environmental solution
    Bulletin of the American Physical Society, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, October 4-8, 2010, Paris France, Volume 55, Number 7, BT2.00004 (2010.10)
    T. Kawakami, M. Shinohara, K. Hara, Y. Matsuda, H. Fujiyama, Y. Nitta, T. Nakatani
  23. Plasma Generation in Organic Solvent for Amorphous Carbon Film Deposition
    Transactions of MRS-Japan, vol. 35 No. 3 pp. 567-570 (2010.9)
    M. Shinohara, S. Zhang, K. Kotani, K. Akaki, Y. Matsuda, H. Fujiyama
  24. Substrate Bias Effects on Amorphous Carbon Film Deposition Process during Acetylene Plasma, Investigated with Infrared Spectroscopy
    Transactions of MRS-Japan, vol. 35 No. 3 pp. 563-566 (2010.9)
    M. Shinohara, H. Kawazoe, T. Kawakami, T. Inayoshi, Y. Matsuda, H. Fujiyama, Y. Nitta, and T. Nakatani
  25. アセチレンプラズマを用いたアモルファス炭素膜の成膜過程の赤外分光解析
    表面科学、Vol.31, No.8 pp. 400-404 (2010.8)
    篠原正典，川副大樹，稲吉孝紀，河上貴聡，原幸治郎，松田良信，藤山寛，新田祐樹，中谷達行
  26. Energy influx to a substrate during inductively-coupled-plasma assisted sputtering
    10th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 23th SPSM (Symposium on Plasma Science for Materials) Abstracts, July4-8, 2010, LOTTE Hotel, Jeju Korea, PP246, p.393 (2010.7)
    Y. Matsuda, R. Kan, H. Kitagawa, M. Shinohara
  27. Difference of deposition process of an amorphous carbon film due to source gases
    Thin Solid Films, Vol. 518, pp. 3497-3501 (2010.4)
    M. Shinohara, H. Kawazoe, T. Inayoshi, T. Kawakami, Y. Matsuda, H. Fujiyama, Y. Nitta and T. Nakatani
  28. アモルファス炭素膜のプラズマ気相化学堆積過程の観察
    表面科学 vol.31 No.3 pp.156-161(2010.3).
    篠原正典、松田良信、藤山寛、中谷達行
  29. Substrate temperature effects on amorphous carbon film growth, investigated by infrared spectroscopy in multiple internal reflection geometry
    J. Vac. Sci. Technol.A, Vol. 27 pp. 813-817 (2009.7)
    M. Shinohara, K. Cho, Y. Matsuda, T. Inayoshi, H. Kawazoe, H. Fujiyama, Y. Nitta and T. Nakatani
  30. Interaction between hydrogen plasma and hydrogenated amorphous carbon film investigated by infrared spectroscopy
    Thin Solid Films, Vol. 516, Issue 13, 1 May 2008, pp.4379-4383 (2008.5)
    M. Shinohara, K. Cho, H. Shibata, K. Okamoto, T. Nakatani, Y. Matsuda and H. Fujiyama
  31. Sputter-Deposition of Aluminum-Doped Zinc Oxide Thin Films Assisted by Inductively Coupled Plasma
    Abstracts and Full-Paper CD of the 18th Int. Symp. on Plasma Chemistry, August 26-31, 2007, Kyoto, Japan, p.396 (2007.8)
    S. Iwai, Y. Matsuda, M. Shinohara, and H. Fujiyama
  32. Investigation of evolution hydrocarbon species on a Si surface during methane plasma with and without substrate bias using infrared spectroscopy in multiple internal reflection geometry
    Appl. Sur. Sci., Vol. 253 pp.6242?6247 (2007.5)
    M. Shinohara, H. Shibata, K. Cho, T. Nakatani, K. Okamoto, Y. Matsuda, and H. Fujiyama
  33. Effects of Substrate Temperature on Adsorption of Hydrocarbon Species Generated in Methane Plasma
    Transactions of the Materials Research Society of Japan, Vol. 32, No. 2, pp. 473-476 (2006.12)
    M. Shinohara, K. Cho, Y. Matsuda and H. Fujiyama, K. Okamoto, T. Nakatani
  34. Infrared spectroscopic study of thermal annealing effects of hydrocarbon species on a Si surface exposed to methane plasma
    Applied Surface Science, Vol. 252, Issue 24, pp. 8589-8592 (2006.10)
    M. Shinohara, K. Iwatsuji, T. Katagiri, H. Shibata, Y. Matsuda and H. Fujiyama
  35. Evolution of hydride species on a silicon surface during methane plasma investigated by in-situ infrared spectroscopy
    Thin Solid Films, Vol. 506-507, pp. 710-714 (2006.5)
    M. Shinohara, T. Katagiri, K. Iwatsuji, H. Shibata, Y. Matsuda, and H. Fujiyama
  36. マイクロホローカソード光源を用いた真空紫外吸収分光法の開発
    長崎大学工学部研究報告, 第35巻, 第64号, 35-40頁 (2005.3)
    井出義行, 篠原正典, 松田良信, 藤山寛
  37. 多重外部反射赤外分光法の開発
    長崎大学工学部研究報告, 第35巻, 第64号, 29-34頁 (2005.3)
    倉本宰弘, 篠原正典, 松田良信, 藤山寛
  38. 細管内壁コーティングのためのヘリコン波プラズマ源の開発
    長崎大学工学部研究報告, 第35巻, 第64号, 23-28頁 (2005.3)
    小島裕爾, 篠原正典, 松田良信, 藤山寛
  39. Optical emission studies of atomic and ionic species in the ionized sputter-deposition process of magnesium oxide thin films
    Thin Solid Films, Vol. 475, No.1-2 pp. 113-117 (2005.3)
    Y. Matsuda, Y. Koyama, M. Iwaya, M. Shinohara and H. Fujiyama
  40. Oxidation of the hydrogen terminated silicon surfaces by oxygen plasma investigated by in-situ infrared spectroscopy
    Thin Solid films, Vol. 475, No.1-2 pp. 128-132 (2005.3)
    M. Shinohara, T. Katagiri, K. Iwatsuji, Y. Matsuda, H. Fujiyama, Y. Kimura and M. Niwano
  41. Plasma oxidation process of silicon surfaces investigated by infrared spectroscopy
    J. Adv. Oxid. Technol., Vol.8, No. 1, pp. 41-46. (2005.1)
    M. Shinohara, T. Katagiri, K. Iwatsuji, Y. Matsuda, Y. Kimura, M. Niwano, and H. Fujiyama
  42. 酸素プラズマ中でのSi表面水素の挙動
    表面科学 vol.25 No.9 pp.541-547(2004.9)
    篠原正典、片桐輝昭、岩辻圭太郎、松田良信、藤山寛、木村康男、庭野道夫
  43. Oxygen-plasma induced hydrogen desorption from hydrogen-terminated Si(100) and (111) surfaces investigated by infrared spectroscopy
    Thin Solid films vol.464-465 pp. 14-17 (2004.9)
    M. Shinohara, T. Katagiri, K. Iwatsuji, Y. Matsuda, H. Fujiyama, Y. Kimura and M. Niwano
  44. Effect of inductively-coupled plasma assist on the crystal orientation of magnesium oxide thin films produced by reactive sputtering
    Thin Solid Films, Vol.457, pp.64-68(2004.5)
    Y. Matsuda, M. Iwaya, Y. Koyama, M. Shinohara, and H. Fujiyama
  45. ハーモニック電子サイクロトロン共鳴マイクロプラズマ源の開発
    長崎大学工学部研究報告, 第33巻, 第61号, 57-62頁 (2003.7)
    松下正典、松田良信、藤山寛
  46. MgO薄膜高速成膜のための誘導結合プラズマ支援反応性スパッタリング法の開発
    長崎大学工学部研究報告, 第33巻, 第61号, 47-52頁 (2003.7)
    小山 悠，篠原正典，松田良信，藤山 寛
  47. 基板表面磁界がスパッタ薄膜結晶配向性に及ぼす影響
    長崎大学工学部研究報告, 第33巻, 第61号, 41-46頁 (2003.7)
    丸本　洋，篠原正典，松田良信，藤山　寛
  48. Development of High Frequency Micro Plasma Source in a Magnetic Field
    Thin Solid Films, Vol.435, pp. 285-287 (2003.5)
    M. Matsushita, Y. Matsuda and H Fujiyama
  49. MgO Deposition Using Reactive Ionized Sputtering
    Thin Solid Films, Vol.435, No.1-2, pp.154-160(2003.5)
    Y. Matsuda, Y. Koyama, K. Tashiro, and H. Fujiyama
  50. New Reactive Sputtering Model Considering the Effect of the Electron Emission Coefficiency for MgO Deposition
    IEICE Trans. Electron., Vol.E84-C, No.11, pp.1667-1672 (2001.11)
    Y. Matsuda, K. Tashiro, K. Otomo, and H. Fujiyama
  51. Quantitative modeling of reactive sputtering process for MgO thin film deposition
    Thin Solid Films, Vol.390, pp.59-63(2001.8)
    Y.Matsuda, K.Otomo and H.Fujiyama
  52. Preparation of Multi-Layer Carbon Nitride Films by Alternate Process of Magnetron Sputtering and Ion Beam Implantation
    Surface and Coatings Technology, Vol.131, pp.428-432 (2000.12)
    T.Shibata, Y.-S Jin, Y.Matsuda and H.Fujiyama
  53. Structural and Bonding Properties of Carbon Nitride Thin Films Prepared by DC Magnetron Sputtering
    Thin Solid Films, Vol.345, No.1, pp.18 - 22 (1999.5)
    Y.-S. Jin, T. Shibata, Y. Matsuda and H. Fujiyama
  54. Two-dimensional spatial distributions of sputtered particles produced in a planar magnetron discharge of indium-tin-oxide target
    Thin Solid Films, Vol.345, No.1, pp.167 - 171(1999.5)
    Y.Matsuda, M.Muta and H.Fujiyama
  55. Two-Dimentional Spatial Profiles of Plasma Parameters in DC Reactive Magnetron Sputtering of ITO
    Thin Solid Films, Vol.341, No.1-2, pp.221-224 (1999.3)
    M.Muta, S.Ohgushi, Y.Matsuda, and H.Fujiyama
  56. Effects of Nitrogen Ion Beam Irradiation on a-C and CNx Thin Films
    Jpn. J. Appl. Phys., Vol.37, pp.L1260-L1263 (1998.10)
    Y.S.Jin, T.Shibata, Y.Matsuda and H.Fujiyama
  57. Growth and Properties of CNx Films Prepared by Reactive DC Magnetron Sputtering
    Jpn. J. Appl. Phys., Vol.37, pp.4544-4549 (1998.8)
    Y.-S.Jin, Y.Matsuda and H.Fujiyama
  58. Experimental comparison of rotational and gas kinetic temperatures in N2 and He-N2 discharges
    J. Phys. D: Appl. Phys., Vol.31, pp.1556-1564 (1998.7)
    A.N.Goyette, J.R.Peck, Y. Matsuda, L.W.Anderson and J.E.Lawler
  59. C2 column densities in H2/Ar/CH4 microwave plasmas
    J. Vac. Sci. Technol. A, Vol.16, No.1, pp.337-340 (1998.1)
    A.N.Goyette, Y.Matsuda, L.W.Anderson and J.E.Lawler
  60. Optogalvanic Detection of Oxygen Negative Ions in Reactive Sputtering Process
    Surface & Coatings Technology, Vol.98, No.1-3, pp.1420-1425(1998.1)
    Y.Matsuda, K.Shuto, H.Nagamatsu, H.Fujiyama
  61. Plasma Cathode-Surface Interactions in Reactive Magnetron Sputtering for Indium-Tin-Oxide Thin Film Deposition
    Surface & Coatings Technology, Vol.98, No.1-3, pp.1286-1292 (1998.1)
    Y.Matsuda, Y.Yamori, S.Ohgushi, M.Muta, H.Fujiyama
  62. High-Pressure Non-Equilibrium Microwave Plasma Source by Using Carbon Materials
    Surface & Coatings Technology, Vol.97, pp.404-409(1997.12)
    S.Maeda, H.Matsuo, K.Kuwahara, Y.Matsuda, H.Kuwabara and H.Fujiyama, H.Kuwahara
  63. Influence of a Modulated Magnetic Field on the Behaviours of Particulate in Silane Plasma CVD
    Surface & Coatings Technology, Vol.97, pp.366-371(1997.12)
    S.C.Yang, Y.Maemura, K.Tazoe, Y.Matsuda and H.Fujiyama
  64. Relation between Plasma Parameters and Film Properties in DC Reactive Magnetron Sputtering of Indium-Tin-Oxide
    Japanese Journal of Applied Physics, Vol.36, No.7B, pp.4922-4927 (1997.7)
    Y.Matsuda, Y.Yamori, M.Muta, S.Ohgushi and H.Fujiyama
  65. プローブ併用オプトガルバノ法による酸素負イオンの空間分布計測
    電気学会プラズマ研究会資料, EP-97-13, pp.25-30 (1997.3)
    永松仁子，松田良信，藤山　寛
  66. Concentration Measurement of Oxygen Negative Ions in an Argon/Oxygen Glow Discharge Using Probe-Assisted Optogalvanic Spectroscopy
    Proc. 3nd Int. Conf. on Reactive Plasmas and 14th Sympo. on Plasma Processing, Nara, 21-24 Jan. 1997, P3-26, pp.431-432 (1997.1)
    Y.Matsuda, K.Shuto, H.Nagamatsu and H.Fujiyama
  67. An Experimental Comparison of Rotational Temperature and Gas Kinetic Temperature
    Proc. 3nd Int. Conf. on Reactive Plasmas and 14th Sympo. on Plasma Processing, Nara, 21-24 Jan. 1997, P3-26, pp.81-82 (1997.1)
    A.N.Goyette, W.B.Jameson, Y.Matsuda, J.R.Peck, L.W.Anderson and J.E.Lawler
  68. C2 Swan Band Absorption in a Microwave Plasma
    Proc. of 49th Annual Gaseous Electronics Conference, 20-24 Oct. 1996, Argonne Illinois, WPA.07 (Bulletin of the American Physical Society, Vol.41, p.1327) (1996.10)
    A.N.Goyette, Y.Matsuda, L.W.Anderson, and J.E.Lawler
  69. Rotational Temperature in a Nitrogen Positive Column Discharge
    Proc. of 49th Annual Gaseous Electronics Conference, 20-24 Oct. 1996, Argonne Illinois, WPA.08 (Bulletin of the American Physical Society, Vol.41, p.1328) (1996.10)
    J.R.Peck, A.N.Goyette, Y.Matsuda, L.W.Anderson, and J.E.Lawler
  70. Control of Particulate Behavior in Silane Plasmas by a Modulated Magnetic Field
    Proc.of 3rd Asia-Pasific Conference on Plasma Science and Technology, Vol.2, pp.453-458 (1996.7)
    S.C.Yang, Y.Nakajima, Y.Maemura, Y.Matsuda and H.Fujiyama
  71. Mechanism of Particle Transport in Magnetized Silane Plasmas
    Plasma Sources Science and Technology, Vol.5, No.2, pp.333-338 (1996.5)
    S.C.Yang, Y.Nakajima, Y.Maemura, Y.Matsuda and H.Fujiyama
  72. Particle Formation and Its Transport in Magnetized Silane Plasmas
    電気学会プラズマ研究会資料，EP-95-105, pp.151-156 (1995.10)
    S.C.Yang, Y.Nakajima，Y.Maemura, K.Kuwahara, Y.Matsuda and H.Fujiyama
  73. Plasma Cathode-Surface Interaction in Reactive Magnetron Spettering
    IUVSTA Int. Workshop on Plasma Sources and Surface Interactions in Materials Processing, Fuji-Yoshida, Japan, September 20-22 1995,PII-20, p.92 (1995.9)
    Y.Matsuda, K.Ano, Y.Yamori and H.Fujiyama
  74. High Pressure Microwave Plasma Source by Using Carbon Materials
    IUVSTA Int. Workshop on Plasma Sources and Surface Interactions in Materials Processing, Fuji-Yoshida, Japan, September 20-22 1995,PI-29, p.72 (1995.9)
    H.Fujiyama, K. Kuwahara, S. Maeda, H. Matsuo, Y.Matsuda and H. Kuwabara
  75. Mechanism of Particle Transport in Magnetized Silane Plasmas
    IUVSTA Int. Workshop on Plasma Sources and Surface Interactions in Materials Processing, Fuji-Yoshida, Japan, September 20-22 1995,PI-17, p.60 (1995.9)
    S.C.Yang, Y.Nakajima, Y. Maemura, Y.Matsuda and H.Fujiyama
  76. Effect of Silicon particles on DC and AC Discharge Characteristics in Magnetized Silane Plasmas
    12th International Symposium on Plasma Chemistry, Minneapolis, Vol.3, pp.1295-1300 (1995.8)
    H.Fujiyama, S.C.Yang, Y.Nakajima, Y.Maemura and Y.matsuda
  77. Optogalvanic Detection of Oxygen Negative Ions in Reactive Sputtering Process
    Proc. of the 2nd Asia-Pacific Conference on Plasma Science and Technology, Daejeon, September 25-27 1994, D1-38,pp.239-242 (1994.9)
    K.Shirakata, K.Shutoh, Y.Matsuda and H.Fujiyama
  78. Studies of Reactive Sputtering Process in ITO Thin Film Deposition Using Laser Induced Fluorescence
    Proc. of the 2nd Asia-Pacific Conference on Plasma Science and Technology, Daejeon, September 25-27 1994, D1-35,pp.227-230 (1994.9)
    K.Ano, Y.Yamori, Y.Matsuda and H.Fujiyama
  79. Correlation between Silicon Particles and Plasma Resistance in DC Magnetized Silane Plasmas
    Proc. of the 2nd Asia-Pacific Conference on Plasma Science and Technology, Daejeon, September 25-27 1994, D1-28,pp.204-207(1994.9)
    S.C.Yang, Y.Matsuda and H.Fujiyama
  80. Dynamics of Silicon Particles in DC Silane Plasmas Transported by a Modulated Magnetic Field
    Japanese Journal of Applied Physics, Vol.33, No.7B, pp.4216-4220 (1994.7)
    H.Fujiyama, H.Kawasaki, S.-C.Yang and Y.Matsuda
  81. Influence of Heavy Particle Collision on Optical Emission in the Cathode Fall Region of a DC Argon/Silane Glow Discharge
    Japanese Journal of Applied Physics, Vol.33, No.7B, pp.4357-4360 (1994.7)
    Y.Matsuda, H.Kawasaki, and H.Fujiyama
  82. Laser Induced Fluorescence Observation of In-Atoms Produced by DC Reactive Sputtering of Indium-Tin Oxide Target
    Japanese Journal of Applied Physics, Vol.33, No.7B, pp.4469-4472 (1994.7)
    Y.Matsuda, T.Kido, K.Ano, K.Shirakata, H.Fujiyama
  83. Laser Spectroscopy in Low Temperature Plasmas
    The 3rd Joint Symposium of Nagasaki University and Cheji National University on High Technology, Nagasaki, April 25-27, 1994, D-4, pp.151-156 (1994.4)
    Y.Matsuda
  84. 反応性スパッタリングにおけるスパッタ粒子のレーザー分光計測
    電気学会プラズマ研究会資料, EP-94-13, 19-28頁 (1994.3)
    松田良信, 城戸拓也, 阿野一巳, 白方一浩, 藤山 寛
  85. Dynamics of Silicon Particles in DC Silane Plasmas Transported by a Modulated Magnetic Field
    Proc. of 2nd Int. Conf. on Reactive Plasmas and 11th Sympo. on Plasma Processing, Yokohama, 19-21 Jan. 1994, Xa-7, pp.569-572 (1994.1)
    H.Fujiyama, H.Kawasaki, S.C.Yang, Y.Matsuda
  86. Influence of Heavy Particle Collision on Optical Emission in the Cathode Fall Region of a DC Argon/Silane Glow Discharge
    Proc. of 2nd Int. Conf. on Reactive Plasmas and 11th Sympo. on Plasma Processing, Yokohama, 19-21 Jan. 1994, VIIId-9, pp.527-530 (1994.1)
    Y.Matsuda, H.Kawasaki, H.Fujiyama
  87. Laser Induced Fluorescence Observation of Density Profiles of Sputtered Indium Atoms During DC Reactive Sputtering of Indium Tin Oxide Target
    Proc. of 2nd Int. Conf. on Reactive Plasmas and 11th Sympo. on Plasma Processing, Yokohama 19-21 Jan. 1994, VIIIb-17, pp.435-438 (1994.1)
    Y.Matsuda, T.Kido, K.Ano, K.Shirakata, and H.Fujiyama
  88. レーザー誘起蛍光法による反応性スパッタリング中の中性インジウム原子密度計測
    長崎大学工学部研究報告, 第24巻, 第42号, 51--58頁 (1994.1)
    城戸拓也, 阿野一巳, 白方一浩, 松田良信
  89. Dynamics of Silicon Particles in the Modulated Crossed Magnetic and Electric Fields in Silane Plasmas
    Proc. of the 6'th Asian Conference on Electrical Discharge, Oita 24-26 Nov. 1993, pp.155-158 (1993.11)
    H.Fujiyama, H.Kawasaki, S.-C.Yang, and Y.Matsuda
  90. Measurement of Sputtered Indium in Indium-Tin Oxide (ITO) Sputtering Using Laser Induced Fluorescence
    Proc. of the 6'th Asian Conference on Electrical Discharge, Oita 24-26 Nov. 1993, pp.143-146 (1993.11)
    Y.Matsuda, T.Kido, K.Ano, H.Fujiyama
  91. Extension of the Child-Langmuir Law to Magnetron Discharge
    Proc. of the 6'th Asian Conference on Electrical Discharge, Oita 24-26 Nov. 1993, pp.135-138 (1993.11)
    K.Kuwahara, Y.Matsuda, H.Fujiyama
  92. 高リュードベリ原子を用いた高感度電磁界計測に関する研究
    御器谷科学技術財団助成研究・国際交流活動報告集, 第1号, 34−36頁 (1993.2)
    松田良信
  93. Electric Field Structure in the Cathode Fall Region of a Hollow Cathode Discharge
    Proc. of the 10th Symposium on Plasma Processing, Osaka 26-28 January 1993, pp.435-438 (1993.1)
    Y.Matsuda, F.Amazaki, T.Kido, H.Fujiyama
  94. Mechanism of the Optical Emission in the Cathode Sheath on a DC Glow Discharge
    Proc. of the 10th Symposium on Plasma Processing, Osaka 26-28 January 1993, pp.235-238 (1993.1)
    H.Kawasaki, T.Kido, Y.Matsuda, H.Fujiyama
  95. Discharge Characteristics for Electrodes Covered with Hydrogenated Amorphous Silicon
    Proc. of the 10th Symposium on Plasma Processing, Osaka 26-28 January 1993, pp.211-214 (1993.1)
    H.Kawasaki, S.C.Yang, Y.Matsuda, H.Fujiyama
  96. Electric Field Measurement in the Cathode Fall Region of a Hollow Cathode Discharge by Laser Optogalvanic Spectroscopy
    Proc. of the 5th Asian Conference on Electrical Discharge, pp.149-152, Singapore (1992.11)
    Y.Matsuda, F.Amazaki, H.Fujiyama
  97. Temporal Variation of Discharge Characteristics for Electrodes Covered with Hydrogenated Amorphous Silicon Preparation Control by a Magnetic Field
    Proc. of Japanese Symposium on Plasma Chemistry, Vol.4, pp.99-103 (1992.10)
    H.Kawasaki, S.C.Yang, Y.Matsuda, H.Fujiyama
  98. Secondary Electron Emission from Electrode Surface Covered with Hydrogenated Amorphous Silicon
    Proc. of 45th Annual Gaseous Electronics Conference, 27-30 Oct. 1992, Boston, DC-5, p90 (1992.10)
    H.Kawasaki, S.C.Yang, Y.Matsuda, H.Fujiyama
  99. Optogalvanic Measurement of Electric Fields in Neon Hollow Cathode Discharges
    Proc. of 45th Annual Gaseous Electronics Conference, 27-30 Oct. 1992, Boston, DB-26 p84 (1992.10)
    Y.Matsuda, F.Amazaki, H.Fujiyama
  100. ネオン原子の高リュードベリ状態のシュタルク構造
    長崎大学工学部研究報告, 第22巻, 第39号, 147-154頁 (1992.7)
    天崎文晶, 松田良信, 藤山　寛
  101. 二段階レーザー励起オプトガルバノ法によるネオンホローカソード放電中の電界計測
    長崎大学工学部研究報告, 第22巻, 第39号, 139-145頁 (1992.7)
    松田良信, 天崎文晶, 藤山　寛
  102. Discharge Characteristics for Electrodes Covered with a-Si:H Films
    Proceedings of the 9th Symposium on Plasma Processing, Fukuoka 22-24 January 1992, pp.87-90 (1992.1)
    H.Kawasaki, T.Nakajima, Y.Matsuda, H.Fujiyama
  103. プラズマ診断用狭帯域二波長パルス色素レーザー
    長崎大学工学部研究報告, 第22巻, 第38号, 33-40頁 (1991.12)
    松田良信, 天崎文晶, 藤山 寛
  104. Control of Generation and Transport of Ions and Radicals and Film Preparation Control by a Magnetic Field
    Proc. 4'th Asian Conference on Electrical Discharge, Pusan, 18-22 Oct. 1991, pp.177-180 (1991.10)
    H.Kawasaki, Y.Matsuda, H.Fujiyama
  105. Uniform Sputter-Deposition of Titanium Nitride Thin Films by Using New Magnetron Discharge
    Proc. 4'th Asian Conference on Electrical Discharge, Pusan, 18-22 Oct. 1991, pp.116-119 (1991.10)
    K.Kuwahara, Y.Matsuda, H.Fujiyama
  106. Development of Quadrupole Plasma CVD Method for Low Temperature and High-Speed Coating on Optical Fiber
    Materials Science and Engineering A, Vol.139, pp.79-84(1991.8)
    H.Fujiyama, T.Kashima, Y.Matsuda
  107. Averaging Effect of Radical Particle Profile by the Scanning Plasma Method in SiH4/Ar Plasmas
    Materials Science and Engineering A, vol.140, pp.569-575 (1991.9)
    H.Fujiyama, H.Kawasaki, T.Ohno, Y.Matsuda
  108. Development of Large Area Sputter-Coating Method Using a New Magnetron Discharge
    Materials Science and Engineering A, vol.140, pp.691-695 (1991.9)
    K.Kuwahara, Y.Matsuda, H.Fujiyama
  109. Development of Large Area Sputter-Coating Method Using Magnetized AC Plasmas with Inclined Electrodes
    Materials Science and Engineering A, vol.140, pp.563-568 (1991.9)
    Y.Matsuda, K.Kuwahara, H.Fujiyama
  110. Trial Preparation of Uniform Titanium Nitride Thin Films by Using New Magnetron Sputter Coating Method
    Proc. of the Int. Seminar on Reactive Plasmas, Nagoya, 17-19 June 1991, CA-14 pp.93-96 (1991.6)
    Y.Matsuda, K.Kuwahara, H.Fujiyama
  111. Gamma-Electron Impact Excitation And Emission in The Cathode Sheath of A SiH4 Glow Discharge
    Proc. of the Int. Seminar on Reactive Plasmas, Nagoya, 17-19 June 1991, CA-07, pp.65-68 (1991.6)
    H.Kawasaki, Y.Matsuda, H.Fujiyama
  112. Two-Dimensional Profiles of Emissive Species in a Magnetized SiH4/Ar Glow Discharge For the Scanning-Plasma CVD Method
    IEEE Transactions on Plasma Science, Vol.19, No.2, pp.445-451 (1991.4)
    H.Fujiyama, H.Kawasaki, T.Ohno, Y.Matsuda
  113. Preparing of Large-Area Uniform Thin Film Using a Modulated Cross Magnetic Field
    Proceedings of the 8th Symposium on Plasma Processing,Nagoya 22-24 January 1991, pp.185-188 (1991.1)
    H.Kawasaki, Y.Matsuda, H.Fujiyama
  114. High-Rate Uniform Sputtering Using a New Magnetron Effect
    Proceedings of the 8th Symposium on Plasma Processing,Nagoya 22-24 January 1991, pp.33-36 (1991.1)
    Y.Matsuda, K.Kuwahara, H.Fujiyama
  115. プラズマ計測のための高出力LC反転形窒素レーザーの製作
    長崎大学工学部研究報告, 第21巻, 第36号, 1-8頁 (1991.1)
    松田良信, 藤山　寛
  116. Two-Dimensional Structure of Reactive Silane Plasmas in the Presence of Crossed Magnetic and Electric Fields
    Materials Research Society Symposium Proceedings,San Francisco, 17-19 April 1990, Vol.190 pp.161-166 (1990.4)
    H.Fujiyama, H.Kawasaki, T.Ohno, Y.Matsuda
  117. Two-Dimensional Profile of Emissive Species in a SiH4/Ar Glow Discharge
    Proceedings of the 7th Symposium on Plasma Processing, Tokyo 23-26 January 1990, pp.289-292 (1990.1)
    H.Kawasaki, Y.Matsuda, H.Fujiyama
  118. Profile Control of Radical Particles by the Scanning Plasma Method
    Proceedings of the 7th Symposium on Plasma Processing, Tokyo 23-26 January 1990, pp.289-292 (1990.1)
    H.Fujiyama, H.Kawasaki, Y.Matsuda
  119. Basic Parameters and Fluctuation Measurements on GAMMA 10
    Proc. 4th Int. Symp. on Laser-Aided Plasma Diagnostics, Fukuoka, 20-23 Nov. 1989, pp.183-188 (1989.11)
    A.Mase, A.Itakura, J.H.Jeong, N.Yamaguchi, K.Ishii, M.Inutake, S.Miyoshi, Y.Matsuda, K.Muraoka, K.Mizuno
  120. Measurements of Atomic Hydroden Density Profiles in GAMMA 10 by laser Fluorescence Spectroscopy
    Proc. 4th Int. Symp. on Laser-Aided Plasma Diagnostics, Fukuoka 20-23 Nov. 1989, pp.223-227 (1989.11)
    Y.Matsuda, K.Uchino, K.Muraoka, M.Akazaki, M.Maeda, A.Mase, A.Itakura, N.Yamaguchi, M.Inutake, S.Miyoshi
  121. Averaging Effect of Radical Particles by a Modulated Magnetic Field in Reactive Plasmas
    Proc. 4th Int. Symp. on Laser-Aided Plasma Diagnostics, Fukuoka, 20-23 Nov. 1989, pp.437-441 (1989.11)
    H.Fujiyama, H.Kawasaki, T.Ohno, Y.Matsuda
  122. 走査プラズマ法による多電極グロー放電の電子密度平均化効果
    電気学会研究会資料プラズマ研究会 EP-89-75〜70 (1989.8)
    川崎仁晴, 大野哲靖, 松田良信, 藤山　寛
  123. Amorphous-Carbon Coating of Optical Fiber by the Quadrupole CVD Method
    Proc. 2'nd Asian Conference on Electrical Discharge, Nagasaki, 20-21 Aug. 1989 pp.181-184 (1989.8)
    H.Fujiyama, H.Kawasaki, T.Kashima, Y.Matsuda
  124. Control of Reactive Plasmas by a Magnetic Field
    Proc. 2'nd Asian Conference on Electrical Discharge, Nagasaki, 20-21 Aug. 1989 pp.173-176 (1989.8)
    H.Kawasaki, K.Kuwahara, T.Ohno, Y.Matsuda, H.Fujiyama
  125. Preparing of Large-area Thin Films Using the Averaging Effect of Radical Particles by the Scanning Plasma Method
    Proc. 2'nd Asian Conference on Electrical Discharge, Nagasaki, 20-21 Aug. 1989 pp.85-88 (1989.8)
    H.Fujiyama, H.Kawasaki, Y.Matsuda
  126. Generation of Line-Plasma Using Quadrupole Electrodes
    Proceedings of the 6th Symposium on Plasma Processing, Kyoto 25-27 January 1989, pp.423-426 (1989.1)
    H.Kawasaki, J.Yamaguchi, Y.Matsuda, H.Fujiyama
  127. Magnetized Plasma Sputtering Equipment with Honneycomb Cylindrical Electrodes
    Proceedings of the 6th Symposium on Plasma Processing, Kyoto 25-27 January 1989, pp.419-422 (1989.1)
    H.Kawasaki, Y.Matsuda, H.Fujiyama
  128. Control of Reactive Plasma by a Magnetic Field
    Proceedings of the 6th Symposium on Plasma Processing, Kyoto 25-27 January 1989, pp.173-176 (1989.1)
    H.Fujiyama, H.Kawasaki, T.Ohno, Y.Matsuda
  129. Measurement of Preferential Sputtering of Iron-Oxides Using Laser Fluorescence Spectroscopy
    Japanese Journal of Applied Physics, Vol.27, No.11, pp.L2022-L2024 (1988.11)
    Y.Matsuda, K.Yamaguchi, K.Suenaga, Y.Yamagata, C.Honda, M.Maeda, K.Muraoka, M.Akazaki
  130. Detailed Measurements of Differential Sputtering Yields Using Laser Fluorescence Spectroscopy
    ION BEAM INTERACTIONS WITH SOLIDS (Reports of the Special Project Research Supported by the Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture of JAPAN (1985-1987), pp.237-240 (1988.10)
    K.Muraoka, Y.Matsuda, T.Kajiwara, M.Maeda, T.Okada, C.Honda
  131. Development of Sputtering Equipment with Honeycomb Electrodes by Scanning Plasma Method
    Proc. Asian Conf. on Electrical Discharge, Karatsu, 25-26 Aug.1988, pp.139-140 (1988.8)
    Y.Matsuda, H.Kawasaki, H.Fujiyama
  132. E×B Drift Flux in Magnetized CVD Plasmas
    Proc. Japanese Symp. on Plasma Chemistry, Tokyo, 28-29 July 1988, pp.163-168 (1988.6)
    H.Kawasaki, Y.Matsuda, H.Fujiyama
  133. In-Situ Measurement of Sputtering Yield of Graphite by VUV Laser Fluorescence Spectroscopy
    Japanese Journal of Applied Physics, Vol.27, No.6, pp.1105-1106 (1988.6)
    T.Kajiwara, Y.Matsuda, K.Muraoka, T.Okada, M.Maeda, M.Akazaki
  134. Development of Laser Diagnostics for Studies of High Temperature Plasmas and Plasma-Surface Interaction
    Materials Research Society Symposia Proceedings, Vol.117, pp.257-261 (1988.5)
    K.Muraoka, K.Uchino, T.Kajiwara, Y.Matsuda, K.Matsuo, H.-J.Kim, M.Maeda, T.Okada, C.Honda, M.Akazaki
  135. Measurement of Differential Sputtering Yields by Laser Fluorescence Spectroscopy
    Nuclear Instruments and Methods in Physics Research, B33, pp.511-514 (1988.1)
    Y.Matsuda, K.Yamaguchi, T.Kajiwara, K.Muraoka, M.Akazaki, C.Honda, T.Okada, M.Maeda, Y.Yamamura, E.Kawatoh, J.Fujiya
  136. Light Element Detection Using Laser Fluorescence Spectroscopy
    Proc. 3rd Int. Symp. on Laser-Aided Plasma Diagnostics, Los Angeles, 28-30 Oct. 1987, pp.67-70 (1987.10)
    T.Kajiwara, Y.Kaga, Y.Matsuda, T.Okada, M.Maeda, K.Muraoka, M.Akazaki
  137. Measurement of Neutral Hydrogen Density in GAMMA-10 Using Balmer Alpha Laser Fluorescence Spectroscopy
    Proc. 3rd Int. Symp. on Laser-Aided Plasma Diagnostics, Los Angeles, 28-30 Oct. 1987, pp.71-73 (1987.10)
    Y.Matsuda, Y.Kinjo, I.Tokunaga, K.Uchino, K.Muraoka, M.Akazaki, M.Maeda, A.Mase, A.Itakura, M.Inutake, GAMMA10 group
  138. Ruby-Laser Scattering Diagnostics of a Supersonic Plasma Flow for Low Pressure Plasma Spraying
    Japanese Journal of Applied Physics, Vol.26, No.10, pp.L1724-L1726 (1987.10)
    R.Hidaka, T.Ohki, K.Takeda, K.Kondo, H.Kanda, Y.Matsuda, K.Uchino, K.Muraoka, M.Akazaki
  139. Developments and Applications of Laser Fluorescence for Plasma-Chemical Researches
    Proc. 8th Int. Symp. on Plasma Chemistry, Tokyo, 31 Aug.- 4 Sept. 1987, pp.495-499 (1987.9)
    K.Muraoka, M.Maeda, T.Okada, C.Honda, Y.Matsuda, T.Kajiwara, H.-J. Kim, M.Akazaki
  140. Detailed Measurements of Differential Sputtering Yields by Ion-Beam Bombardment Using Laser Fluorescence Spectroscopy
    Journal of Nuclear Materials, Vol.145&146, pp.421-424 (1986.12)
    Y.Matsuda, S.Matsubaguchi, C.Honda, M.Maeda, T.Okada, Y.Yamamura, K.Muraoka, M.Akazaki
  141. Velocity-Distribution Functions of Sputtered Atoms Caused by Insufficiently Developed Collision-Cascades
    Japanese Journal of Applied Physics, Vol.25, No.8, pp.1256-1257 (1986.8)
    Y.Matsuda, Y.Yamamura, C.Honda, S.Matsubaguchi, M.Maeda, K.Muraoka, M.Akazaki
  142. Transient Change in the Velocity Distribution Functions of Sputtered Atoms during Initial Dose in Ion-Beam Bombardment
    Japanese Journal of Applied Physics, Vol.25, No.3, pp.L182-L184 (1986.3)
    Y.Matsuda, C.Honda, S.Matsubaguchi, T.Moroishi, K.Muraoka, M.Maeda, M.Akazaki
  143. Energy Dependence of Angular Distributions of Sputtered Particles by Ion-Beam Bombardment at Normal Incidence
    Japanese Journal of Applied Physics, Vol.25, No.1, pp.8-11 (1986.1)
    Y.Matsuda, Y.Yamamura, Y.Ueda, K.Uchino, K.Muraoka, M.Maeda, M.Akazaki
  144. Measurements of Fluorescence Line Profiles with a Rapid-Frequency-Scan Laser in Plasma Devices
    Proc. 2nd Int. Symp. on Laser-Aided Plasma Diagnostics, Oxford, 10-12 Sept. 1985, pp.109-114 (1985.9)
    C.Honda, Y.Matsuda, T.Moroishi, M.Maeda, S.Matsubaguchi, K.Muraoka, M.Akazaki
  145. Developments and Applications of Laser-Fluorescence for Studies of Particle-Behaviours in Plasma-Surface Interactions
    Journal of Nuclear Materials, Vol. 128&129, pp.977-981 (1984.7)
    K.Muraoka, M.Maeda, T.Okada, C.Honda, M.Hamamoto, K.Uchino, T.Kajiwara, Y.Matsuda, Y.Itsumi, M.Akazaki, T.Kawamoto, R.Kumazawa, S.Okamura, H.E.Garnern and RFC-XX-M group
  146. レーザ蛍光法によるスパッタリング過程の研究Ｉ（鉄原子スパッタリングの放出角度分布）
    九州大学総合理工学研究科報告, 第5巻, 第2号, 153-161頁 (1983.12)
    松田良信、浜本誠、前田三男、村岡克紀、赤崎正則
  147. 大気中インパルス放電過程のルビーレーザ散乱による研究
    九州大学総合理工学研究科報告, 第4巻, 第2号, 161-169頁 (1983.1)
    内野喜一郎、村岡哲弘、松田良信、村岡克紀、赤崎正則

comment, book

  1. 松田良信, 金属添加酸化亜鉛透明導電膜スパッタ成膜過程におけるプラズマ支援効果, 「【最新】光学薄膜の最適設計・成膜技術と膜厚・膜質・光学特性の制御」（金原　粲監修）の第４章第23節, pp.352-357 (技術情報協会,2013年6月28日)ISBN 978-4-86104-485-4 C3058
  2. Y. Matsuda, A. Hirashima, K. Mine, T. Hashimoto, D. Matsuoka, M. Shinohara, T. Okada, Deposition of Aluminum-Doped ZnO Films by ICP Assisted Sputtering, in "ZnO Nanocrystals and Allied Materials", Springer Series in Materials Science, Vol. 180, Rao, M S Ramachandra; Okada, Tatsuo (Eds.), 2013, 275 pages, ISBN 978-81-322-1159-4 (Springer India, 2013), pp.125-148（分担執筆　20pages） (2013.9)
  3. 松田良信、メタルスパッタプラズマの高度化調査専門委員会編，メタルスパッタリングプラズマの高度化とその最新動向，基礎・材料・共通部門技術報告，No. 1162　ページ数52ページ（2009/07/15, 電気学会電子図書館）（分担執筆　pp.39-42）